研究業績 / 仲村
論文
固体材料（金属や酸化物）における原子拡散
Diffusion of oxygen in amorphous HfO2
Yuna Motozu, Ryusuke Nakamura, Sota Hoshishima, Takeyuki Suzuki
Journal of Physics and Chemistry of Solids, 199, 112499 (2025)
Diffusion of boron in an amorphous iron-boron alloy
Takumi Hamaguchi, Ryusuke Nakamura, Kohta Asano, Takeshi Wada, Takeyuki Suzuki
Journal of Non-Crystalline Solids, 601, 122070 (2023)
二次イオン質量分析法によるα鉄中のホウ素の拡散浸透プロファイルの測定と拡散係数の決定
濱名 桂佑, 仲村 龍介, 沼倉 宏, 鈴木 健之
鉄と鋼, 106, 302-309 (2020)
Diffusion of oxygen in amorphous Al2O3, Ta2O5, and Nb2O5
R. Nakamura, T. Toda, S. Tsukui, M. Tane, M. Ishimaru, T. Suzuki, H. Nakajima
Journal of Applied Physics, 116, 033504 (2014)
Diffusion mechanisms in B2NiAl phase studied by experiments on Kirkendall effect and interdiffusion under high pressures
R Nakamura, K Fujita, Y Iijima, M Okada
Acta Materialia, 51, 3861-3870 (2003)
Single-phase interdiffusion in the B2 type intermetallic compounds NiAl, CoAl and FeAl
R Nakamura, K Takasawa, Y Yamazaki, Y Iijima
Intermetallics, 10, 195-204 (2002)
アモルファス物質（金属 / 半導体 / 酸化物）の構造変化と結晶化
Explosive crystallization of amorphous germanium-tin films by irradiation with a 3-keV electron beam
R. Nakamura, M. Miyamoto, M. Ishimaru
Journal of Applied Physics, 133, 185304 (2023)
Explosive crystallization of sputter-deposited amorphous germanium films by irradiation with an electron beam of SEM-level energies
R. Nakamura, A. Matsumoto, M. Ishimaru
Journal of Applied Physics, 129, 215301 (2021)
Dual crystallization modes of sputter-deposited amorphous SiGe films
M. Okugawa, R. Nakamura, H. Numakura, M. Ishimaru, H. Yasuda
Journal of Applied Physics, 128, 015303, (2020)
The relation between amorphous structure and explosive crystallization of sputter-deposited amorphous germanium thin films
M. Okugawa, R. Nakamura, H. Numakura, A. Heya, N. Matsuo, H. Yasuda
Japanese Journal of Applied Physics, 58, 045501, (2019)
Structure of crystallized particles in sputter-deposited amorphous germanium films
M. Okugawa, R. Nakamura, A. Hirata, M. Ishimaru, H. Yasuda, H. Numakura
Journal of Applied Crystallography, 51, 1467-1473 (2018)
Structural transition in sputter-deposited amorphous germanium films by aging at ambient temperature
M. Okugawa, R. Nakamura, M. Ishimaru, K. Watanabe, H. Yasuda, H. Numakura
Journal of Applied Physics, 119, 214309 (2016)
Atomic rearrangements in amorphous Al2O3 under electron-beam irradiation
R. Nakamura, M. Ishimaru, H. Yasuda, H. Nakajima
Journal of Applied Physics, 113, 064312 (2013)
ナノ中空粒子，ナノチューブおよびナノポーラス薄膜の作製
The Kirkendall effect and nanoscience: hollow nanospheres and nanotubes
Abdel-Aziz El Mel, Ryusuke Nakamura, Carla Bittencourt
Beilstein Journal of Nanotechnology, 6, 1348-1361 (2015)
Formation of highly oriented nanopores via crystallization of amorphous Nb2O5 and Ta2O5
R. Nakamura, M. Ishimaru, K. Sato, K. Tanaka, H. Nakajima, T. J. Konno
Journal of Applied Physics, 114, 124308 (2013)
Formation of oxide nanotubes via oxidation of Fe, Cu and Ni nanowires and their structural stability: Difference in formation and shrinkage behavior of interior pores
R. Nakamura, G. Matsubayashi, H. Tsuchiya, S. Fujimoto, H. Nakajima
Acta Materialia, 57, 5046-5052 (2009)
Hollow oxide formation by oxidation of Al and Cu nanoparticles
R. Nakamura, D. Tokozakura, H. Nakajima, J.-G. Lee, H. Mori
Journal of Applied Physics, 101, 074303 (2007)
招待講演
弱い電子ビームの照射によるアモルファスゲルマニウム薄膜の瞬間かつ広域結晶化
日本金属学会 2023年春期講演大会 シンポジウム「特異反応場における時間/空間応答を利用した新奇材料構造創成III」，2023年3月9日
Diffusion of boron in alpha-iron: Long-range diffusion measurement by secondary ion mass spectroscopy
15th International Conference on Diffusion in Solids and Liquids (DSL2019), 2019年6月27日
アモルファス Ge 薄膜の結晶化における安定相と準安定相の競合
第78回 応用物理学会 秋季学術講演会 シンポジウム「IV 族系半導体の製膜と低温結晶化（固相結晶化を中心に）」， 2017年9月7日
Inhomogeneous crystallization of sputter-deposited amorphous Ge films
International workshop on Active-Matrix Flatpanel Display and Devices (AM-FPD 17) , 2017年7月7日
アモルファス酸化物の潜在的欠陥構造に由来するナノポーラス構造の形成
日本セラミックス協会 第26回秋季シンポジウム，2013年9月
